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Alkali-removable process protection material SLY00-P*

產品描述:Product Description: Our liquid peelable photosensitive polyimide is a multifunctional material with unique properties, highly favored in the PCB industry. It is suitable for protecting inner-layer pads and step finger protection in multilayer boards and rigid-flex boards. The industry commonly uses tapes, peelable blue tapes, or PI films for protection. Microcosm's photosensitive heat-resistant temporary protective adhesive can be directly printed, exposed, and developed. It withstands high temperatures and can endure multiple high-temperature pressing processes without sticking to the FPC. It can also be removed by conventional alkali washing processes without leaving residue on the pad surface, making it easy to operate.

Product Featuresimage.png


1. Easy Removal with No Residue

Easily removable using standard alkaline solutions, ensuring clean, residue-free pads.

2. Photosensitive

Ideal for applications requiring precise protection in small areas

3. High-Temperature Compression Resistant

Maintains shape and stability under high-temperature and high-pressure conditions. 

Withstands five cycles of 230 °C for 1.5 hours without diffusion or deformation, and can tolerate temperatures above 320 °C.

4. Flexible Thickness Control

Printing thickness can be adjusted according to the structural protection requirements of the product.


Applications

l   Cavity Packaging Structures: Protects embedded pads from contamination.

l   Multilayer Board Copper Plating Isolation

l   Gold Finger Protection

l   Step-Leveling and Filling for Rigid-Flex Board Lamination

 

Product Type & Specific Applications

SLY00-P* Series

l   Non-reactive with PP, suitable for resist mask, copper pad, circuit, and finger protection

l   Alkaline/degreasing resistant, can replace PI tape, ideal for protection during the brown oxide process

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Product Specification

Item

Condition

Unit

SLY00-P*

Coating Thickness

Screen Printing

μm

20–100

Pre-baking Condition

Temperature

°C

90

Time

min

9–10

Exposure Condition

Wavelength (365/385/405   nm)

mJ/cm²

200–500

Developing Condition

1% K₂CO₃ (or Na₂CO₃) at   30 °C

sec

60–120

Resolution

Round hole / Line width

μm

100


 

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