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Polybenzoxazole (P-PSPBO)

產品描述:Product Description: Photosensitive Polybenzoxazole (PSPBO) is an outstanding heat-resistant photosensitive dielectric insulating material widely used in critical fields such as microelectronics and aerospace. Its excellent photosensitivity, mechanical strength, heat resistance, insulating properties, low water absorption, and low dielectric constant make it an ideal choice for these advanced applications.

Product Applications

In semiconductor packaging technology, especially in Fan-Out Wafer-Level Packaging (FOWLP) and Redistribution Layer (RDL) processes, PSPBO serves as a photoresist material playing a crucial role in interlayer dielectric materials, stress buffer layers, and protective coatings. In these advanced processes, the low coefficient of thermal expansion (CTE) of PSPBO helps improve chip stability under temperature fluctuations. Its high mechanical strength enhances chip durability against physical stress, while the low dielectric constant ensures low signal loss during high-speed data transmission. The combination of these properties significantly enhances chip performance and long-term reliability under various environmental conditions.


Product Features

  • Low-temperature curing

  • Low coefficient of thermal expansion

  • High development resolution: film thickness/via = 5 µm / 5 µm, 10 µm / 10 µm

  • Low dielectric loss: Df < 0.01 @ 10 GHz

  • Aqueous solvent development

  • Excellent chemical resistance: effectively resists corrosion from various organic solvents, inorganic acids, and alkaline solutions



Product Specifications

Test   Item

Unit

WLPT01-B

Exposure / Development

/


Exposure Dose

mJ/cm²

350–550

Developer

-

2.38% TMAH

Resolution (Film Thickness /   Via)

µm

10/5 ; 10/10

Cure Conditions



Cure Temperature

°C

250–300

Thermal Properties



Glass Transition Temp (Tg)

°C

>300

Coefficient of Thermal Expansion (CTE)

ppm/K

<55



For product-related information or detailed specifications, please contact us.

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