Product Applications
In semiconductor packaging technology, especially in Fan-Out Wafer-Level Packaging (FOWLP) and Redistribution Layer (RDL) processes, PSPBO serves as a photoresist material playing a crucial role in interlayer dielectric materials, stress buffer layers, and protective coatings. In these advanced processes, the low coefficient of thermal expansion (CTE) of PSPBO helps improve chip stability under temperature fluctuations. Its high mechanical strength enhances chip durability against physical stress, while the low dielectric constant ensures low signal loss during high-speed data transmission. The combination of these properties significantly enhances chip performance and long-term reliability under various environmental conditions.
Product Features
Low-temperature curing
Low coefficient of thermal expansion
High development resolution: film thickness/via = 5 µm / 5 µm, 10 µm / 10 µm
Low dielectric loss: Df < 0.01 @ 10 GHz
Aqueous solvent development
Excellent chemical resistance: effectively resists corrosion from various organic solvents, inorganic acids, and alkaline solutions
Product Specifications
Test Item | Unit | WLPT01-B |
Exposure / Development | / | |
Exposure Dose | mJ/cm² | 350–550 |
Developer | - | 2.38% TMAH |
Resolution (Film Thickness / Via) | µm | 10/5 ; 10/10 |
Cure Conditions | ||
Cure Temperature | °C | 250–300 |
Thermal Properties | ||
Glass Transition Temp (Tg) | °C | >300 |
Coefficient of Thermal Expansion (CTE) | ppm/K | <55 |
For product-related information or detailed specifications, please contact us.